Leung Wallace Woon-fong showcases his invention and awards he won at the Geneva International Exhibition of Inventions. (Photo source: Ming Pao Daily)
(ECNS) – A mask with a nanofiber filter has been invented by a professor at Hong Kong Polytechnic University, which can resist 80 percent of pollutant particulates, according to the Ming Pao Daily.
Leung Wallace Woon-fong spent nine years developing the multi-layer nanofiber filter, which also won awards at the Geneva International Exhibition of Inventions.
Made with several layers of nanofibers and non-wovens, the mask can resist 80 percent of particulates no less than 300 nanometers, compared with the 28 percent that traditional masks can obstruct, Leung said.
As the filter material is lighter and thinner than traditional ones, adding one more layer of nanofilter can make the mask function as well as an N95 mask, but its breathability is much better, according to Leung.
Leung added that some other functions such as sterilization can be added to the mask, but he didn't reveal its functions, as a patent is being sought.
Cooperation on manufacturing the mask is in negotiations, and it's possible the new mask may be on the market by the end of the year, Leung said.
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